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Liquid Phase Deposition of ZnO Nanorods

As we know that ZnO is an II-VI semiconductor material which has wide range attractive applications for electronic and optoelectronic devices.Therefore, I will short-reported the low temperature growth ZnO nanorods by using liquid phase deposition (LPD).

The nanostructure has significant research interest due to of its specific physical properties and its potential use as a building block for nano-electronics and nano-optolectronics. In AMD lab, I am doing this research.  The ZnO nanrodos growth on an ITO-laminated plastic substrate of PET by using LPD technique with zinc nitrate hexahydrate, Zn(NO3)2 and hexamethylenetetramine (HMT), C12H6N14 as main solution. The solution and  plastic substrate was contained in teflon vessel and heated at varied deposition temperatures between 70° C and 95° C for 5 hours.

The concentration of HMT solution was varied between 0.10 M and 0.20 M, whereas the zinc nitrate hexahydrate solution was kept at 0.10 M. The control of the films’ morphology was also adjusted using a 0.1 M NaOH solution. Finally, the films were rinse and dried using deionized water and dry nitrogen, respectively.

Finally, ZnO nanorods on an ITO-laminated PET plastic substrate had been successfully grown in an aqueous solution under low temperature. This method was found to enable the control of the ratio of diameter to the length of the nanorods, making it applicable for the control of flexible nano-electronic devices.